Werner W. Brandt

Werner W. Brandt

Professor Emeritus

Phone: 414-229-5035
e-mail: wwbrandt@uwm.edu

Degree(s):

Ph.D., Polytechnic Institute of Brooklyn

Research Description:

Professor Brandt was an Associate Professor at UWM from 1965 to 1985, Department Chair from 1976-1978, Professor from 1985 to 1992 and Professor Emeritus from 1992 until present. Research areas included: basic studies in plasma chemistry and solid state reactions; diffusion measurements on high polymers, zeolites, etc., and computer simulations related thereto. Recent interests include: searching the chemical literature via computer, and relating chemistry to liberal arts..

From September 1992 to August 1994, Professor Brandt was a Fulbright Senior Scholar at the University of Niarobi, Kenya, Africa, lecturing and collaborating on current research.

Teaching activities over the years:

Professor Brandt taught undergraduate courses in physical chemistry, quantitative analysis, and general chemistry (lectures and laboratories in all three courses), senior seminar, chemical literature, and a novel course "Chemistry and the Liberal Arts".

Graduate courses taught included: thermodynamics, statistical mechanics, quantum chemistry, chemical kinetics, solid state chemistry, computational methods in physical chemistry, physical chemistry of high polymers, graduate seminars and colloquia.

Professor Brandt obtained a number of grants for teaching equipment, such as laser instrumentation, in addition to his sizable research grants.

Selected Publications:

"Development of a Chemistry Department in an Industrialized Society; Challenges and Some Solutions", W.W. Brandt, Proc. Inaugural Conf. Kenya Chem. Soc. 3, (1993).

"Plasma and Reagent Pulse Induced Transients on the Etching of Si by NF3", I. Ishii and W.W. Brandt, J. Electrochem.Soc., 133, 1240 (1996).

"Mass Spectrometric Transient Study of DC Plasma Etching of Si in SF6/O2 Mixtures", W.W. Brandt and T. Honda, J. Appl. Phys., 60, 1595 (1986).

"Plasma Etching of Si Using NF3 Pulses Injected into He or Ar; Sputtering vs. Reactive Ion Etching", W.W. Brandt and I. Ishii, Proc. 7th International Symposium on Plasma Chemistry, C.J. Timmermans, (ed), IUPAC, Eindhoven, Holland, 971 (1985).